Journal of Vacuum Science & Technology B - AIP Publishing LLC
Fabrication of reproducible sub-5 nm nanogaps by a focused ion beam and observation of Fowler-Nordheim tunneling
Gate-controlled ZnO nanowires for field-emission device application
PDF) Roller nanoimprint lithography. J Vac Sci Technol B
PDF) Synthesis of TiN/N-doped TiO 2 composite films as visible light active photocatalyst Synthesis of TiN/N-doped TiO 2 composite films as visible light active photocatalyst
Ex situ Lift Out of PFIB Prepared TEM Specimens | Microscopy and Microanalysis | Cambridge Core
PDF) Monitoring chamber walls coating deposited during plasma processes: Application to silicon gate etch processes | Laurent Vallier and Martin Kogelschatz - Academia.edu
PDF) Study of the NF3 plasma cleaning of reactors for amorphous silicon deposition | Giovanni Bruno - Academia.edu
Growth and characterization of germanium epitaxial film on silicon (001) with germane precursor in metal organic chemical vapour deposition (MOCVD) chamber – topic of research paper in Materials engineering. Download scholarly article
Solved 1,0 Helium ion exposure 0.8 3. (25 pts) The right | Chegg.com
![PDF] Direct detection and imaging of low-energy electrons witk delta-doped charge-coupled devices | Semantic Scholar](https://d3i71xaburhd42.cloudfront.net/02b24a55d118620d5552380e5ca130033708d3c4/12-Figure2-1.png "PDF] Direct detection and imaging of low-energy electrons witk delta-doped charge-coupled devices | Semantic Scholar")
PDF] Direct detection and imaging of low-energy electrons witk delta-doped charge-coupled devices | Semantic Scholar
Nanoscale control of energy and matter in plasma–surface interactions: Toward energy- and matter-efficient nanotecha)
Atomic relocation processes in impurity-free disordered p -GaAs epilayers studied by deep level transient spectroscopy
PDF) Monte Carlo calculations of the beam flux distribution from molecular-beam epitaxy sources
The Filler Laboratory at Georgia Tech
PDF) Sub-150 nm, high-aspect-ratio features using near-field phase-shifting contact lithography | Mark Horn - Academia.edu
PDF) Analytical transmission electron microscopy observations on the stability of TiCN in electrically conductive α-β SiAlON/TiCN composites | Hilmi Yurdakul - Academia.edu
PDF) Nanomachining with a focused neon beam: A preliminary investigation for semiconductor circuit editing and failure analysis
EUV Maskless Lithography J. Vac. Sci. Technol. B 30, (2012); 9/25/20121K. Johnson - ppt download
Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
A synchrotron beamline for extreme-ultraviolet photoresist testing
